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Work done during the final report period is presented. The main technical objective was to achieve epitaxial growth on silicon of two semiconducting silicides, ReSi2 and CrSi2. ReSi2 thin films were grown on (001) silicon wafers by vacuum evaporation of rhenium onto hot substrates in ultrahigh vacuum. The preferred epitaxial relationship was found to be ReSi2(100)/Si(001)

Title : Narrow Bandgap Semiconducting Silicides: Intrinsic Infrared Detectors on a Silicon Chip
Author : National Aeronautics and Space Administration
Language : en
Rating :
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Type : PDF, ePub, Kindle
Uploaded : Apr 07, 2021

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